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来源：百度知道 编辑：UC知道 时间：2024/06/15 02:33:42
The general configuration of the atom-lithography process
is illustrated in Fig. 1. The atomic beam is initially
mechanically collimated, and then further collimated by
passing through a region in which there is a laser light
radiation field that collimates the atomic beam transversely,
reducing the transverse velocity spread and hence the divergence
of the beam. The highly collimated beam of atoms
then passes through a standing wave of the radiation
field, which is formed by a retro-reflected near-resonant
laser beam grazing across the surface of the substrate onto
which the atoms are deposited. While passing through the
standing wave the atoms experience a dipole force at the
node, which acts as a lens, causing them to focus and to
form patterns as they deposit onto the surface
is illustrated in Fig. 1. The atomic beam is initially
mechanically collimated, and then further collimated by
passing through a region in which there is a laser light
radiation field that collimates the atomic beam transversely,
reducing the transverse velocity spread and hence the divergence
of the beam. The highly collimated beam of atoms
then passes through a standing wave of the radiation
field, which is formed by a retro-reflected near-resonant
laser beam grazing across the surface of the substrate onto
which the atoms are deposited. While passing through the
standing wave the atoms experience a dipole force at the
node, which acts as a lens, causing them to focus and to
form patterns as they deposit onto the surface
原子光刻过程的一般配置在图1中演示
最初原子束由机械校准，
然后进一步原子束通过一个使得原子束自身横向偏移速度减小并加强发散的激光辐射场来校准，
然后经过高度校准的原子束穿过驻波辐射，这是由一个剥落在衬底表面上原子沉积的逆行反映协同共振激光束。
原子在经过驻波点时由于晶体作用，受到偶极引力，引起原子束集聚和形成模式，原因是它们沉积在表面