谁帮我翻译成英文拉,拜托

来源:百度知道 编辑:UC知道 时间:2024/05/30 10:41:36
MOS器件进入纳米尺寸以来,沟道区的空间电荷不再象长沟道器件那样基本上全都由栅极电压控制,漏源两区的电势对沟道区的影响随着沟道长度变得越来越显著 。为了正确描述MOS器件的电学特性,精确的阈值电压Vth模型很重要。本文基于BSIM标准分析了短沟道效应(SCE)和漏感生势垒下降(DIBL)对阈值电压造成的影响,发现当栅电介常数K=25,沟道长度L<100nm时,随着沟道长度的减小,阈值电压迅速减小。
拜托不要用翻译软件,不然我也会了

Since MOS component entrance accepts meter of dimension, channel area space electric charge resembles the long channel component no longer becoming more and more notable with channel the length like that mainly all from grid electrode voltage impact of the electric potential controlling , leaving out two area of source's over channel area. Characteristic property describing MOS component electricity as a science for rightness, the accurate threshold value voltage Vth model is very important. Effect the main body of a book is brought about owing to that the BSIM standard has analysed the fault channel effect (SCE) with has leaving out induced barrier potential coming down (DIBL) to threshold value voltage, discover upright ding-dang bars electricity constant K = 25, channel the length L <100 nm time, with channel the length diminution , the prompt threshold value voltage diminution.