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Magnetron sputtering method used in high-vacuum conditions, the deposition of metal Fe to Si (100) substrate, the formation of Fe-Si compound, and then through the vacuum annealing furnace at different temperatures and different times of the samples under the conditions of heat treatment To generate β-FeSi2 film. X-ray diffraction (XRD) of the samples were crystal structure analysis, using scanning electron microscopy (SEM) on the microstructure of the surface samples were characterized generated β-FeSi2 find the best film annealing parameters.

Adopt magnetism method to accuse of sputter, under high vacuum terms, deposit metal Fe to (100) Si substrate pay, form Fe-Si compound, retreat through vacuum stove heat-treat to the sample under different temperature and different time terms, make it produce β - FeSi2 membrane. Adopt X ray diffraction appearance carry on crystal structure analyze to sample, utilize, scan electric mirror (SEM) to sample showing micro-structure si