UC知道=======跪求＝＝＝＝机械英语翻译，在线等。感谢好心人
来源：百度知道 编辑：UC知道 时间：2024/05/26 01:58:33
Polishing is a process that produces a smooth. two basic mechanisms are involved in the polishing process:(a) fine-scale abrasive removal, and(b) softening and smearing of surface layer by frictional heating during polishing.
The electropolishing process smoothes and streamlines the microscopic surface of a metal object. Mirror-like finishes can be obtained on metal surfaces by electropolishing
In electropolishing, the metal is removed ion from the surface of the metal object being polished. Electrochemistry and the fundamental principles of electrolysis replace traditional mechanical finishing techniques. In basic terms, the object to be electropolished is immersed in an electrolyte and subjected to a direct electrical current. The object is maintained anodic, with the cathodic connection being made to a nearby metal conductor.
Smoothness of the metal surface is one of the primary and most advantageous effects of electropolishing. During the process, a film of varyin
The electropolishing process smoothes and streamlines the microscopic surface of a metal object. Mirror-like finishes can be obtained on metal surfaces by electropolishing
In electropolishing, the metal is removed ion from the surface of the metal object being polished. Electrochemistry and the fundamental principles of electrolysis replace traditional mechanical finishing techniques. In basic terms, the object to be electropolished is immersed in an electrolyte and subjected to a direct electrical current. The object is maintained anodic, with the cathodic connection being made to a nearby metal conductor.
Smoothness of the metal surface is one of the primary and most advantageous effects of electropolishing. During the process, a film of varyin
抛光是一个过程，生产顺利。两个基本机制是在抛光过程： （一）罚款大规模磨料搬迁，及（ b ）软化与抹黑的表面层摩擦加热过程中，抛光。
在电解过程中平滑和简化微观面的一个金属物体。镜子般的饰面可从金属表面电解
在电解，金属离子去除，从表面上的金属物体被磨光。电化学和基本原则，电解法取代传统的机械加工技术。在基本条款，该物体被电解是沉浸在中电解质及遭受直接的电流。目的是保持阳极与阴极方面正在作出附近的一个金属导体。
光滑的金属表面，其中一个最主要的和最有利的影响电解。在这个过程中，电影的不同厚度涵盖金属表层。这部影片是最厚超过微观预测。电阻正处于最低而电影是最薄的，造成的最大速度金属溶出。电解选择性地消除了微观高点或"高峰"快的速度袭击了相应的微凹陷或"山谷"的股票是移走金属盐。金属去除某些情况下是可以控制和能如期举行，以0.0001至0.0025毫米。
化学机械抛光技术正日益成为重要的一步，在制作的，多层次的综合电路。化学机械抛光是指抛光丰富的泥浆进行交互两种化学和机械与表面被磨光。在化学机械抛光过程中，旋转晶圆是压面落旋转，适应力强，抛光垫，而抛光浆料含磨料颗粒及化学试剂流动之间的晶圆及垫。联合行动的抛光垫，磨料颗粒和化学试剂，结果在材料搬运及抛光晶圆表面。化学机械抛光制造单位，损坏免费对各种脆性材料，它广泛用于对硅片在制造集成电路。
楼上的翻译的很烂哦。
不想翻就不要翻，不要用什么翻译软件番嘛。