UC知道材料专业英语翻译(很短)(英译中) 用翻译软件就免了25
来源：百度知道 编辑：UC知道 时间：2024/06/04 16:34:45
7.2.4 Current Status of Sputtering
Magnetron sputtering is the most widely used sputtering method and one of the wellestablished
coating techniques used for microelectronic applications such as
metallization and magnetic devices. In the last several years, many nanometer multilayer
structures based on different material systems and/or microstructures have been prepared
by sputtering. However, the material systems are mainly limited to conductors and
nitrides. Nevertheless, nanolayer BaTiO3 (Jia, et al., 1995a) and nanometer multilayer
structures based on simple oxide materials such as Y2O3/ZeO2 superlattice (Yashar, et al.,
1999) have been prepared by sputtering.
Magnetron sputtering is the most widely used sputtering method and one of the wellestablished
coating techniques used for microelectronic applications such as
metallization and magnetic devices. In the last several years, many nanometer multilayer
structures based on different material systems and/or microstructures have been prepared
by sputtering. However, the material systems are mainly limited to conductors and
nitrides. Nevertheless, nanolayer BaTiO3 (Jia, et al., 1995a) and nanometer multilayer
structures based on simple oxide materials such as Y2O3/ZeO2 superlattice (Yashar, et al.,
1999) have been prepared by sputtering.
7.2.4现状溅射
磁控溅射是最广泛使用的溅射方法和其中的wellestablished
涂层技术用于微电子应用，如
金属和磁性装置。在过去的几年中，许多纳米多层
结构基于不同的材料系统和/或显微组织已准备就绪
由溅射。不过，材料系统，主要是有限的，以指挥家和
氮化物。不过， nanolayer钛酸钡（贾，等人， 1995年）和纳米多层
结构的基础上简单的氧化物材料，如y2o3/zeo2超晶格（亚沙尔，等人，
1999年）已准备由溅射。