UC知道材料专业英语翻译(很短)(英译中) 用翻译软件就免了6
来源：百度知道 编辑：UC知道 时间：2024/06/22 15:50:05
7.2 Sputtering
7.2.1 Principle of Sputtering
Sputtering is accomplished by an energetic particle bombarding a target surface with
sufficient energy (50 eV—1 000 eV) to result in the ejection of one or more atoms from
the target. Typically, the target, which is called the cathode and is the material to be
deposited, is connected to a negative voltage supply. The anode, which is the substrate,
may be grounded, floated, or biased. A gas or a mixture of different gases with a
pressure in the range of from a few mTorr to several hundred mTorr is introduced into
the sputtering chamber through fine controlled valves to provide a medium in which a
glow discharge can be initiated and maintained. The most common gas used for
sputtering is Ar due to its higher secondary emission coefficient for most materials to be
sputtered. Other inert gases can also be used, such as He and Ne. The use of relatively
light gases in sputtering might ease
7.2.1 Principle of Sputtering
Sputtering is accomplished by an energetic particle bombarding a target surface with
sufficient energy (50 eV—1 000 eV) to result in the ejection of one or more atoms from
the target. Typically, the target, which is called the cathode and is the material to be
deposited, is connected to a negative voltage supply. The anode, which is the substrate,
may be grounded, floated, or biased. A gas or a mixture of different gases with a
pressure in the range of from a few mTorr to several hundred mTorr is introduced into
the sputtering chamber through fine controlled valves to provide a medium in which a
glow discharge can be initiated and maintained. The most common gas used for
sputtering is Ar due to its higher secondary emission coefficient for most materials to be
sputtered. Other inert gases can also be used, such as He and Ne. The use of relatively
light gases in sputtering might ease
7.2溅射
7.2.1的原则，溅射
溅射是完成了由一个高能粒子轰击的目标，表面上与
有足够的能量（ 50的EV - 1 000的EV ）的结果，在弹射的一个或多个原子
的目标。通常情况下，目标，即所谓的阴极，是材料，以便
交存，是连接到一个负电压供应。阳极，这是衬底，
可能接地，浮，或失之偏颇。一种气体或混合了不同的气体，与1
在压力的范围由数mtorr几百mtorr引入
溅射商会通过优良的控制阀提供一个中等，其中一
辉光放电可发起和维修保养。最常见的气体用于
溅射氩是由于其较高的次级发射系数为最材料要
溅射。其他惰性气体也可以使用，例如他和NE 。使用相对
轻气体在溅射可能纾缓化学计量问题中遇到的
反应溅射或溅射的复合材料（ kolawa ，等人， 1989年） 。那个
反应气体，如氧气和氮气，引入到沉积商会与
一定比例的惰性气体，以反应气体，如果反应溅射是可预见的。那个
反应气体也可用于存放一些种复合材料的地方
靶表面已被刷新，在溅射。其中一个例子是
溅射钛酸钡薄膜使用化学计量的钛酸钡的目标，如O2的要
介绍了在溅射。